| 摘要 |
<p>PURPOSE:To simplify a process by setting a thickness of the second metal of an MIM element to <=100Angstrom , and forming the second metal and a transparent electrode to the same shape. CONSTITUTION:An insulator 8 of an MIM element on a substrate 6 is formed on the surface of a part except a terminal of the first metal 7. A film thickness of the second metal 9 is <=100Angstrom . A transparent picture element electrode 10 is formed to a prescribed shape on the upper part, too, of the insulator 8 of the MIM element through the second metal 9 of the MIM element. That is to say, the second metal 9 of the MIM element and the transparent picture element electrode 10 have the same shape, can be patterned simultaneously by a photolithography technique, and also can be formed continuously.</p> |
