| 摘要 |
PURPOSE:To perform accurate determination of the concentration of the plating metal ions, by obtaining the concentration of sulfuric acid ions by fluorescent X- ray analysis, thereafter estimating the concentration of sodium sulfate in a plating liquid, and correcting a matrix effect. CONSTITUTION:When X rays 12 are radiated to a plating liquid in a sample holder 3 by an X-ray generator 1, elements in the liquid radiate inherent fluorescent X rays 13. When the radiated fluorescent rays 13 are detected by a semiconductor X-ray detector 4, a pulse current which is proportional to the energy of the X-rays 13, is generated. The pulse wave form is sent to a multiple-wave- height analyzer 7 and the wave heights are analyzed. The output is sent to a CPU 10 through an interface 9 of an operator 8, and the operation for correcting a matrix effect is performed. The final analyzed value is displayed on a display 11. |
