发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To enhance sensitivity, resolution, and film retentivity, and to improve durability by incorporating an alkali-soluble resin and a specified 1,2-quinonediazide. CONSTITUTION:100pts.wt. of an alkali-soluble resin contains 5-100pts.wt. of 1,2-quinonediazidesulfonic acid ester, as a 1,2-quinonediazide compd., selected from at least one kind from a group of alpha- and gamma-pyrone type natural dyes each having a hydroxyl group, a diazine type natural dye having a hydroxyl group, and a quinone type natural die having a hydroxyl group. A support is coated with said mixture and used for pattern formation. Such a compsn. does not precipitate said quinonediazide crystals, and it is high sensivity, high resolution, and high film retentivity, good developability, and sufficient heat resistance for preparation of IC, and it can be used for manufacture of masks, etc.
申请公布号 JPS60163043(A) 申请公布日期 1985.08.24
申请号 JP19840018287 申请日期 1984.02.06
申请人 NIPPON GOSEI GOMU KK 发明人 HOSAKA YUKIHIRO;MIURA TAKAO;HARITA YOSHIYUKI
分类号 G03C1/72;G03F7/004;G03F7/022;H01L21/027 主分类号 G03C1/72
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