发明名称 MASK
摘要 PURPOSE:To make a dimension checking work efficient by entering dimension information near a dimension measuring cell pattern of a mask to make it easy to not only find the cell pattern but also read dimensions. CONSTITUTION:A dimension measuring cell pattern 6 is entered on a reticle 5, and number ''3'' as dimension information 7 is entered near this cell pattern 6. Design value ''3'' is patterned with a number 7' near a dimension measuring cell pattern 6' in each pellet 9 on a mask 8 through a lens 10 for reduction. Thus, it is easy to find the cell pattern 6', and it is unnecessary in reading of the design value to collate a design drawing each time, and the dimension checking work is performed efficiently.
申请公布号 JPS60162257(A) 申请公布日期 1985.08.24
申请号 JP19840015202 申请日期 1984.02.01
申请人 HITACHI SEISAKUSHO KK 发明人 DAN MASAHIRO;KOGA KAZUO;SEKIGUCHI KOUJI
分类号 G03F1/00;G03F1/38;H01L21/027 主分类号 G03F1/00
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