发明名称 TREATER
摘要 PURPOSE:To produce multikinds without obstructing the continuous treatment of a line by spatially arranging a treating section and a carrying section for skipping the treating section to upper and lower sections and constituting both the treating section and the carrying section in a vertically movable manner. CONSTITUTION:A baking furnace 5 as a treating section is installed to an upper section in a base 4 and a skip carrying section 6 to a lower section in a baking device 2 for a semiconductor wafer. The base 4 is kept at the position of downward movement on the wafers W requiring baking, the wafers W being forwarded from a loader section 1 are placed on a heater base 14 for the baking furnace 5 in succession, and the wafers W are sent out to an unloader section 3 when baking is completed. A driving rod 12 is moved to the left by an air cylinder 13 and the base 4 is shifted upward on wafers W requiring no baking. The wafers W are carried to the unloader section 3 from the loader section 1 through the skip carrying section 6. The temperature of the baking furnace need not be lowered every time the wafers are skipped.
申请公布号 JPS60161620(A) 申请公布日期 1985.08.23
申请号 JP19840015232 申请日期 1984.02.01
申请人 HITACHI OUME DENSHI KK;HITACHI SEISAKUSHO KK 发明人 NANKOU SUSUMU;NONAKA TOSHIO;MAEJIMA HIROSHI
分类号 G03F7/26;H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 G03F7/26
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