发明名称 |
TREATER |
摘要 |
PURPOSE:To produce multikinds without obstructing the continuous treatment of a line by spatially arranging a treating section and a carrying section for skipping the treating section to upper and lower sections and constituting both the treating section and the carrying section in a vertically movable manner. CONSTITUTION:A baking furnace 5 as a treating section is installed to an upper section in a base 4 and a skip carrying section 6 to a lower section in a baking device 2 for a semiconductor wafer. The base 4 is kept at the position of downward movement on the wafers W requiring baking, the wafers W being forwarded from a loader section 1 are placed on a heater base 14 for the baking furnace 5 in succession, and the wafers W are sent out to an unloader section 3 when baking is completed. A driving rod 12 is moved to the left by an air cylinder 13 and the base 4 is shifted upward on wafers W requiring no baking. The wafers W are carried to the unloader section 3 from the loader section 1 through the skip carrying section 6. The temperature of the baking furnace need not be lowered every time the wafers are skipped. |
申请公布号 |
JPS60161620(A) |
申请公布日期 |
1985.08.23 |
申请号 |
JP19840015232 |
申请日期 |
1984.02.01 |
申请人 |
HITACHI OUME DENSHI KK;HITACHI SEISAKUSHO KK |
发明人 |
NANKOU SUSUMU;NONAKA TOSHIO;MAEJIMA HIROSHI |
分类号 |
G03F7/26;H01L21/027;H01L21/30;(IPC1-7):H01L21/30 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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