METHOD OF ELECTRON BEAM EVAPORATING REACTIVE METALS ONTO SEMICONDUCTORS,申请号EP19820105478-传众专利搜索

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发明名称	METHOD OF ELECTRON BEAM EVAPORATING REACTIVE METALS ONTO SEMICONDUCTORS
摘要
申请公布号	EP0073312(A3)	申请公布日期	1985.08.21
申请号	EP19820105478	申请日期	1982.06.23
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	DALAL, HORMAZDYAR MINOCHER;LOWNEY, JOHN JOSEPH
分类号	C23C14/04;H01L21/027;H01L21/28;H01L21/285;H01L21/306;H01L29/47;H01L29/872;(IPC1-7):H01L21/00;H01L21/443	主分类号	C23C14/04
代理机构		代理人
主权项
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