| 摘要 |
<p>PURPOSE:To improve the efficiency in production of a multi-faced reticule mask by reducing the reticule pattern part of a specific magnification drawn and formed by a plotter by a projection exposing machine having a specific reducing scale and forming the many patterns to one sheet of a substrate. CONSTITUTION:The pattern data which is a basis for a reticule mask are entered in the form of a magnetic tape 4 or the like. If such data does not adapt itself to such a plotter as a pattern generator (PG) or electron beam plotter, a reticule 7 of a 10-fold pattern is formed by using a plotter 6 such as PG or electron beam plotter via a data processor 5 such as data conversion. The reticule 7 is then exposed by a reducing projection exposing machine 8 having a 1/2-1/3 range. The machine 8 can form about 4-16 mal patterns to one sheet of a substrate within the reduction scale thereof. The accuracy and efficiency in the production of the multi-faced reticule mask are improved by such method.</p> |
