| 摘要 |
PURPOSE:To obtain a photopolymerizable composition for a photoresist having superior safety, photosensitivity and stability by mixing a photopolymerizable ethylenic unsatd. compound with a photopolymn. initiator, a coupler such as an amino-substituted leuco compound, and a specified coupler. CONSTITUTION:A photopolymerizable ethylenic unsatd. compound (A) having plural C=C double bonds such as 2-hydroxyethyl methacrylate is mixed with a photopolymn. initiator (B) which can be activated with active light such as anthraquinone, an amino-substituted leuco compound (C) such as leuco crystal violet or an arylamine compound such as aniline, and a compound (D) represented by the formula (where X is a group having a 6-20C monocyclic or condensed polycyclic aromatic ring, each of R1-R4 is Br, H, 1-3C alkyl or the like, n= 0-2, and m=1-3). The compound (D) include o-xylylene tetrabromide. Thus, the desired photopolymerizable composition is obtd. |
