发明名称 |
Method of forming resist pattern |
摘要 |
A method of forming a resist pattern, which comprises printing a predetermined pattern on a substrate by a lithographic technique using a resist ink curable by irradiation of an active energy ray and/or heating, said ink containing (1) a metal chelate resin obtained by reacting (a) at least one resin selected from the group consisting of alkyd resins, modified alkyd resins, fatty acid-modified epoxy resins, urethanized oils and maleinized oils and (b) a metal compound capable of forming a coordination bond using the resin (a) as a ligand and (2) a polymerizable compound containing at least two ethylenically unsaturated bonds per molecule; and curing the printed pattern by irradiating an active energy ray and/or by heating.
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申请公布号 |
US4536468(A) |
申请公布日期 |
1985.08.20 |
申请号 |
US19840606609 |
申请日期 |
1984.05.03 |
申请人 |
DAINIPPON INK AND CHEMICALS, INC. |
发明人 |
YASUI, TOSHIHIKO;MATSUMOTO, TETSUO;AKAIKE, AKIHIKO |
分类号 |
H05K3/06;C08F2/00;C08F283/00;C09D4/06;C09D11/00;C09D11/02;C09D11/10;G03C5/00;G03F7/00;G03F7/027;G03F7/26;H05K3/00;(IPC1-7):G03C5/00 |
主分类号 |
H05K3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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