发明名称 |
PROCESS FOR MAKING MICROSTRUCTURES ON SOLID STATE BODIES |
摘要 |
1. A process for producing microstructures on a solid body in which a structured surface layer (3) of a material resistant to plasma etching is produced by the deposition of a polymerizable gas under irradiation and in which the structure of the surface layer is transferred to the material of the solid body by plasma etching, characterized in that, before the structured surface layer is formed on the solid body (1), an intermediate layer (6) concentrating the lateral back-scattering of electrons is applied and in that those parts of the intermediate layer which are not convered by the structured surface layer are removed by etching before the structure is applied to the solid body. |
申请公布号 |
DE3171312(D1) |
申请公布日期 |
1985.08.14 |
申请号 |
DE19813171312 |
申请日期 |
1981.08.07 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
FRITZSCHE, CHRISTIAN, DIPL.-PHYS. |
分类号 |
G03F7/004;H01L21/311;H01L21/312;(IPC1-7):H01L21/312 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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