发明名称 WAFER DRIER
摘要 PURPOSE:To drastically reduce suspended dust in a wafer drying chamber and to extremely reduce adhesion of foreign matter on a wafer by making a construction which can exhaust a rotary driving chamber separating from the wafer drying chamber enclosing a rotary driver. CONSTITUTION:A wafer drier consists of a rotor 1, a wafer housing 2 attached to the rotor 1, suppliers 3, 4 of a cleaning gas and washing water, a wafer drying chamber 7 provided with exhausters 5, 6 which exhaust air and water from the chamber, a rotary driver 8 which rotates the rotor 1 and a rotary driving chamber 9 provided with an exhaust port 10 which encloses the rotary driver 8. While the rotor 1 is rotated, the rotary driving chamber 9 is exhausted and number of suspended dust in the wafer drying chamber can be reduced to several tens/ft<3> (diameter 0.5mum or more), less than one 100th. of hitherto.
申请公布号 JPS60154624(A) 申请公布日期 1985.08.14
申请号 JP19840010023 申请日期 1984.01.25
申请人 HITACHI SEISAKUSHO KK 发明人 TAMURA HIROSHI;SAIKI ATSUSHI;SUZUKI MICHIO
分类号 H01L21/304;H01L21/00;(IPC1-7):H01L21/304 主分类号 H01L21/304
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