Method for pattern generation and surfacing of optical elements

摘要

A method for generating patterns progressively changing in configuration from circular through eliptical and oval and inclusive of rectilinear traces is effected by constraining a stylus to movement along mutually othogonal axes, by generating plural sets of stylus displacement forces and by applying such forces in combination to the stylus. The stylus displacement force sets vary with time in respective magnitudes and senses to compel stylus movement progressively in such circular, eliptical, oval and rectilinear patterns. In use of the pattern generating method for surfacing of an optical element, a surfacing tool in engagement with the optical element is displaced as the stylus and the optical element may itself be subjected to oscillatory movement.