| 摘要 |
PURPOSE:To effectively enhance photosensitivity, durability, etc., by using a silicon source material, and a compd. contg. elements of groups III and V of the periodic table for a source material for forming a built-up film as a photoconductive layer. CONSTITUTION:A substrate 2 is arranged at the prescribed position in the inside of a glow discharge build-up chamber 1, the inside of the chamber 1 is evacuated, and the substrate 2 is heated with a heater 2. Gases of Ar, SiH4, and NH3 are introduced into the chamber 1 from cylinders 8, 9, and 10, respectively, and further, a compd. contg. elements of groups III and V of the periodic table, such as borazole or ammonium tetrafluorobarate, is introduced from a cylinder 11. High frequency power is applied to electrodes 6, 7 from a high frequency power supply to cause glow discharge, and a built-up film composed essentially of silicon and contg. the elements of groups III and V of the periodic table is formed. |
