PROCESS FOR MAXIMUM REDUCTION OF WATER DESORPTION IN CHEMICAL LIQUID ACTIVE SUBSTANCE, COMPOSITION CARRIED ON SUPPORT, COMPOSITIONS RESULTING THEREFROM AND APPLICATION THEREOF TOPRODUCE WATER RESISTING SYSTEMS CONTAINING SUCH COMPOSITIONS

摘要

The process of the invention consists of treating the composition and/or the substrate with at least one compatible polar substance selected from the compounds capable of finally giving the substrate or said composition an ionic charge opposite to that of the other or exalting the ionic charge inherent to the composition and/or the treated substrate if such charge is already opposite to that of the other on the one hand, and on the other hand, of simultaneously obtaining a hydrophilous/lipophilous balance HLB such that the surface tension of the support and composition couple is lower than the surface tension of the support and water couple.