发明名称 |
HEAT TREATING DEVICE FOR PLATING DIFFUSION |
摘要 |
PURPOSE:To form a plating diffused layer on the surface of a metallic material with ease by putting a metallic material member into a vacuum vessel and depositing a plating metal by evaporation thereon then heating the member to diffuse the plating metal into the metallic material. CONSTITUTION:A metallic member 1 consisting of a Cu alloy, etc. as a blank material is disposed in a vacuum vessel 2 and is heated to a prescribed temp. by the heating of a resistor 7 using an electric power source 8. The inside of the vessel 2 is evacuated to about 10<-5>Torr by a vacuum pump 3 and a plating metal 4 such as Sn on an evaporation tray 5 is melted and evaporated by a power source 6 to deposit Sn by evaporation on the surface of the member 1. When the thickness of the Sn film deposited by vapor deposition increases 10-20mu, the power source 6 is turned off and the vapor deposition of Sn is stopped. The material 1 is heated to >=400 deg.C in succession to diffuse the Sn deposited by evaporation into the Cn of the metallic material by which the Ni diffused layer having excellent wear resistance is formed. |
申请公布号 |
JPS60152669(A) |
申请公布日期 |
1985.08.10 |
申请号 |
JP19840008514 |
申请日期 |
1984.01.23 |
申请人 |
HITACHI KENKI KK |
发明人 |
TAMURA MORIO;HASHIMOTO HISANORI |
分类号 |
C23C10/28;C23C14/16;C23C14/54;C23C14/58 |
主分类号 |
C23C10/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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