发明名称 HEAT TREATING DEVICE FOR PLATING DIFFUSION
摘要 PURPOSE:To form a plating diffused layer on the surface of a metallic material with ease by putting a metallic material member into a vacuum vessel and depositing a plating metal by evaporation thereon then heating the member to diffuse the plating metal into the metallic material. CONSTITUTION:A metallic member 1 consisting of a Cu alloy, etc. as a blank material is disposed in a vacuum vessel 2 and is heated to a prescribed temp. by the heating of a resistor 7 using an electric power source 8. The inside of the vessel 2 is evacuated to about 10<-5>Torr by a vacuum pump 3 and a plating metal 4 such as Sn on an evaporation tray 5 is melted and evaporated by a power source 6 to deposit Sn by evaporation on the surface of the member 1. When the thickness of the Sn film deposited by vapor deposition increases 10-20mu, the power source 6 is turned off and the vapor deposition of Sn is stopped. The material 1 is heated to >=400 deg.C in succession to diffuse the Sn deposited by evaporation into the Cn of the metallic material by which the Ni diffused layer having excellent wear resistance is formed.
申请公布号 JPS60152669(A) 申请公布日期 1985.08.10
申请号 JP19840008514 申请日期 1984.01.23
申请人 HITACHI KENKI KK 发明人 TAMURA MORIO;HASHIMOTO HISANORI
分类号 C23C10/28;C23C14/16;C23C14/54;C23C14/58 主分类号 C23C10/28
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