CVD DEVICE

摘要

PURPOSE:To prevent solidification and sticking of a gaseous raw material supplied in a gaseous state to the inside of an ejecting nozzle and the inside wall of a reaction tube by heating the ejection nozzle for the gaseous raw material for vapor deposition in the reaction tube of a CVD device. CONSTITUTION:Solid MoCl5 10 is put into a sublimator and is heated by a heater 11 and is thus sublimated. Said material is supplied together with a carrier gas such as Ar supplied from a pipe 12 to the inside of a quartz reaction tube 1 through a pipe material 13. Many wafers 2 are installed to the inside of the tube 1 in a vacuum state. Gaseous H2 is supplied from a nozzle 14 and the vapor of MoCl5 is reduced by H2 to Mo by which the thin film of Mo is formed on the wafers 2. The pipe 13 and the nozzle 20 are heated by heaters 15, 22 to prevent solidification and sticking of the MoCl5 vapor on the inside wall of the nozzle 20 and the tube 1 as a result of cooling and solidification of said vapor owing to the cooling water of a flange 4 for hermetic closing of the tube 1. The clogging of the nozzle 20 by MoCl5 and the sticking thereof to the inside wall of the reaction tube are thus prevented.