| 摘要 |
PURPOSE:To provide an amorphous alloy which contains nitrogen at a high rate and is useful as a ferromagnetic and superconductive material by forming an amorphous alloy film consisting of a specific nitrogen compd. on a specific metallic plate by sputtering. CONSTITUTION:A film is formed on a disc consisting of a metal M by sputtering using a target consisting of a nitrogen compd. of a semimetal or semiconductor element L to prepare an amorphous alloy expressed by MxLyNz without using gaseous nitrogen. The metal M is a combination of a 3D transition metal (1 or >=2 kinds among Fe, Co and Ni) and other metallic elements (for example, Sc, Ti, Cr, etc.) in the case of the ferromagnetic material and a combination of a 4d transition metal (1 or >=2 kinds among Y, Zr, Nb, etc.) and other metallic elements (for example, W, Re, Os, etc.) in the case of the superconductor. B, Si, etc. are used for the element L and are made x+y+z=100, y+z>=10, xnot equal to 0, ynot equal to 0, znot equal to 0.
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