| 摘要 |
PURPOSE:To improve characteristics of a magnetic film formed on a lower insulating film by filling up spaces of a lower conductor coil completely with an insulating film to make the lower insulating film, which is formed on the lower conductor coil, flat. CONSTITUTION:Aluminium 214 is vapor-deposited onto a sapphire substrate 201 and is etched to a prescribed shape to form a lower conductor coil pattern 202, and a resist 203 is peeled. A resist 215 is applied, and the lower conductor coil pattern 202 is used as a mask to perform exposure to light and development from the rear face of the sapphire substrate 201, thereby forming a resist pattern 216 for lift-off of the insulating film filling up spaces of the lower conductor coil. Thus, spaces of the lower conductor coil are filled up completely because of no side etching parts to improve the surface roughness of the insulating film on the lower conductor coil, and pinning for movement of a magnetic wall of the magnetic film formed on this insulating film is prevented to improve the permeability, and thus characteristics of the magnetic film are improved. |
