| 摘要 |
<p>In the production of resist patterns by applying a photosensitive, positive-working resist layer based on photodegradable polymers to a substrate, image-wise exposing the resist layer to actinic light and removing the exposed layer portions to develop the resist pattern, a photosensitive resist layer is used which is made of a poly(diacetylene) which is, in particular, soluble. The invention also relates to dry film resists with a temporary, dimensionally stable layer base, a photosensitive photodegradable resist layer applied thereto and based on poly(diacetylenes), which are preferably soluble, and, optionally, a top layer on the photosensitive resist layer.</p> |
