| 摘要 |
PURPOSE:To obtain a protective thin film having excellent abrasion resistance by introducing at least a gas contg. an organic silicon compd. over a magnetic metallic layer, and glow-discharging while regulating suitably the high-frequency power, the internal pressure of a reactor, and the film-forming speed. CONSTITUTION:The organic silicon protective film has a chemical composition wherein the elementary ratio is regulated to 1.4-2.0 of oxygen (O) to silicon (Si), and/or the organic silicon compd. protective thin film has the physical hardness of 2H-6B pencil scratch hardness. The protective film is manufactured by forming a magnetic thin film of Fe, etc. or the alloy thereof on a flexible plastic film with vapor deposition, etc. Then the film is set in a roll-up type or a common counter electrode type reactor which is evacuated to 10<-3>Torr. A mixed gas of an organic silicon compd., etc. is simultaneously introduced into the reactor, and glow-discharge is generated while keeping the internal pressure at 0.3-3Torr.
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