发明名称 METHOD OF APPLYING RESIST
摘要 PURPOSE:To prevent striae from occurring on the surface of a resist film when a predetermined thickness of the resist is applied on the surface of a planar material while rotating the material at a predetermined speed, by stopping the rotation before the resist hardens. CONSTITUTION:A planar material 1 to be applied with resist is located on a spin head 2 for rotating the material 1, and fixed thereto by vacuum chucking or the like. Resist A is dropped from a nozzle 3 onto the surface of the stationary material 1. The head 2 is then driven to rotate the material at a low rotational speed of about 1,000rpm such that the resist A is diffused all over the surface. After that, the rotational speed is increased to about 5,000rpm. The resist is applied in a thickness slightly larger than the predetermined final thickness, and the rotation is stopped before the resist hardens so that the resist is allowed to harden in a stationary state. According to this method, no difference is produced in movement of the resist A between a part where it has hardened first and a part where it has no hardened yet on the surface of the material to be applied with 1. Therefore, striae can be prevented from occurring in the resist.
申请公布号 JPS60149131(A) 申请公布日期 1985.08.06
申请号 JP19840005892 申请日期 1984.01.17
申请人 FUJITSU KK 发明人 HASHIMOTO HIROSHI
分类号 B05D1/40;G03F7/16;H01L21/027 主分类号 B05D1/40
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