发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To form a Schottky junction, which also resists heat treatment and has excellent characteristics, by forming the Schottky junction to a compound semiconductor constituted by Al.Ga.As while using Al as a constituent as an electrode metal. CONSTITUTION:A high electron-mobility transistor is formed by a compound semiconductor constituted by II-V group elements of Al.Ga.As. A Schottky junction is shaped to an n-GaAlAs layer 3 as the compound semiconductor constituting the high electron-mobility transistor while using Al as the constituent of the layer 3 as a gate 4. The Schottky junction is thermally treated at a temperature lower than the melting point of Al.
申请公布号 JPS60148170(A) 申请公布日期 1985.08.05
申请号 JP19840003874 申请日期 1984.01.12
申请人 FUJITSU KK 发明人 MIMURA TAKASHI
分类号 H01L29/812;H01L21/338;H01L29/47;H01L29/778;H01L29/872 主分类号 H01L29/812
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