| 摘要 |
PURPOSE:To prevent the deterioration with time of an a-Si layer, and to reduce manufacturing cost by applying silicon dioxide films containing not more than 10wt% phosphorus atoms to both surfaces of a soda glass substrate in thickness of 1,000-3,000Angstrom . CONSTITUTION:A soda glass substrate 1 consists of float blue plate glass in thickness such as 1.1mm. one. An silicon dioxide film 2 contains not more than 10wt% phosphorus atoms, and its thickness extends over 1,000-3,000Angstrom . For manufacture a photosensor, a soda glass plate 11 in 1.1mm. thickness having a 1.52 refractive index is dipped into a solution (obtained by dissolving a compound such as a silicon compound [RnSi(OH)4-n]) and an additive into an organic solvent (alcohol as the principal ingredient, ester and ketone) 10 into which SiO2 is dissolved and pulled up, and heated and cured for 1hr at 300 deg.C in air, and an SiO2 film in 1,200Angstrom thickness is formed. An a-Si layer and an N<+> layer are formed through a plasma CVD method, an Al electrode layer is shaped through a vacuum sputtering method, and a predetermined pattern is continuted by using a photolithography technique. |
