| 摘要 |
PURPOSE:To synthesize an inorganic polysilazane suitable for the production of sintered silicon nitride, easily, in high yield, by forming an adduct of a halosilane, and reacting the adduct with ammonia. CONSTITUTION:A halosilane (e.g. dichlorosilane) is added to a base (e.g. pyridine, picoline, etc.) in nitrogen gas atmosphere to form an adduct having a molar ratio (base/halosilane) of 2/1. A mixture of ammonia and nitrogen gas is blasted into and reacted with the adduct to obtain an inorganic polysilazane having a polymerization degree of about 15-40. The reaction temperature is preferably -78-+100 deg.C, especially -40-+80 deg.C.
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