| 摘要 |
PURPOSE:To focus a normally standing image without passing an aperture and reduce aberration of image on a wafer by providing magnetic pole piece at the rear surface side of reticle at the electron beam exposing apparatus of photo electron image reduction type. CONSTITUTION:Voltages V1, V2 are respectively applied to form an electric field on the concentric spherical surfaces K1, K2, a magnetic field is formed with the spherical surfaces considered as S pole and N pole, and respectively intensities are set adequately. Thereby a reduced photo electron image is projected on the spherical surface K1. The pole piece 15 is arranged at the rear side of reticle 11 having the photo electron image at the surface, while field generation coils 12-14 and field forming electrons 16-18 are arranged at the front side of said reticle in order to adequately select the intensity of field. In this case, the electron beam emitted from each point at the surface of reticle 11 with the ultraviolet ray emitted from the light emitting source 19 is accelerated to a virtual center of sphere O' and is focused to the wafer 21 in front of said center. Since aperture is not required, image is not reversed and rotated and optical path difference is small, aberration can be reduced. Moreover, a reduction rate can be determined by the distance ratio L:L' between the spherical center O' and reticle and wafer. |
