| 发明名称 |
Wafer height correction system for focused beam system |
| 摘要 |
Base plate 32 of the wafer support is flexibly mounted with respect to the floor 34 of the target chamber. Flanges 54 and 58 flex by operation of motor 68 to adjust the position of the wafer support with respect to the focal point of the column.
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| 申请公布号 |
US4532426(A) |
申请公布日期 |
1985.07.30 |
| 申请号 |
US19830505563 |
申请日期 |
1983.06.17 |
| 申请人 |
HUGHES AIRCRAFT COMPANY |
发明人 |
REEDS, JOHN W. |
| 分类号 |
H01J37/20;H01J37/21;H01J37/30;H01L21/027;H01L21/68;(IPC1-7):G21K5/10 |
主分类号 |
H01J37/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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