发明名称 Procédé de fabrication notamment de silice finement divisée et de solutions de silicates alcalins pures et les produits conformes à ceux obtenus par le présent procédé ou procédé similaire
摘要 <p>Finely divided silicic acid is prepared from an alkali metal silicate solution with a molar ratio SiO2:M2O (where M is alkali) in the range 2.5:1 to 4.5:1 and a maximum concentration increasing with the above ratios but below 165 g. of SiO2 per litre, by heating said solution to over 100 DEG C. under pressure and separating ppted. silicic acid from the alkali metal silicate solution of reduced SiO2 content. The preferred concn. of SiO2 is 10-125 g./litre and the preferred temperature of reaction is 130-200 DEG C. Solid alkali metal silicate may be added to the resulting silicate solution to produce a fresh starting solution. The SiO2:M2O ratio may be lowered by adding MOH solution. The process may be carried out in a continuous manner, e.g. in an externally heated flow-tube, or in a multi-stage manner. The process may be used for purifying alkali metal silicate solutions since impurities, e.g. Fe, Al and Ti ions, are ppted. from the solution with the silicic acid.</p>
申请公布号 FR1428361(A) 申请公布日期 1966.02.11
申请号 FR19650008671 申请日期 1965.03.10
申请人 HENKEL & COMPAGNIE G.M.B.H. 发明人
分类号 C01B33/18;C01B33/32 主分类号 C01B33/18
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