| 摘要 |
PURPOSE:To make it possible to measure the thickness of each layer of a multi- layered film and to detect the component thereof in a non-destructive manner, by mounting a means for moving the means, which connects a means for projecting finely limited X-ray beam and a means for detecting the same, to a direction vertical to the surface of a specimen. CONSTITUTION:A first layer 1 and a second layer 2 are formed on a substrate B. In measuring the thickness of the first layer 1, an X-ray projection apparatus 3 for emitting X-ray with a known wavelength and an X-ray detection apparatus 4 are set so as to form an angle 2theta1 therebetween and both of them are integrally moved from above to below in a Z-axis direction. When the movement quantity thereof is taken to the axis of abscissas while X-ray detection intensity to the axis of ordinate to perform recording, the difference of Z1 and Z2 comes to the thickness of the first layer 1. Further, the X-ray detector 4 is allowed to scan in a proper range of an angle of about theta1 to measure an X-ray diffraction profile which is, in turn, compared with the preliminarily measured and stored X-ray diffraction profile of a standard specimen to enable the detection of purity of the layer. |
