| 摘要 |
PURPOSE:To prevent the roughening of the surface of a clad layer exposed after forming a spherical lens fitting guide hole by forming an electrode to a semiconductor substrate and forming the spherical lens fitting guide hole. CONSTITUTION:An n type clad layer 6, an active layer 7, a p type clad layer 8, a p type cap layer 9 and an insulating film 10 are shaped to an n type semiconductor substrate 4 in succession. A hole 3 used for constricting currents in depth reaching to the layer 9 is formed at the center of the film 10, and a p side electrode 11 is shaped to the film 10 so as to bury the hole 3. An n side electrode 12 is formed. A resist mask 20 is formed to sections except a section, to which a spherical lens fittig guide hole 5 is shaped, on the surface of the substrate 4, and the section with no mask 20 is etched to form a groove 21. The mask 20 is removed, and an n side electrode 12 is shaped to the substrate 4. A resist mask 22 is formed to a section, in which there is no groove 21, of the surface of the elecrode 12, and the groove 21 is etched to form a spherical lens fitting guide hole 5. |
