| 摘要 |
PURPOSE:To make it possible that the scanning not more than three times completes the alignment by presetting an auxiliary pattern for effecting the alignment efficiently. CONSTITUTION:A pattern 7 having the center point 10 on the extended line of a center line 6 of the pattern 5 for self alignment is formed of silicon oxide. This pattern 7 is an auxiliary pattern for effecting the self alignment efficiently and two sides 7' and 7'' cross at the center point 10 and make and angle of 45 deg. with the center line 6. A width is about 1mum and a length of one side is about 300mum. The scanning direction is parallel to the center line 6. The position of the first scanning with laser beams is designated by 8 and a distance (a) on the pattern 7 is worked out by the first scanning. The position of the second scanning is designated by 9 that has been moved 10mum downward from the position 8 and a distance (b) on the pattern 7 is worked out by the second scanning. Accordingly it becomese clear that the pattern 5 for self alignment exists below the position 9 by a distance l. |
