| 摘要 |
PURPOSE:To obtain a negative type resist having high resolution by substituting glycidyl groups for hydroxyl groups in polyhydroxystyrene. CONSTITUTION:A copolymer consisting of p-hydroxystyrene and styrene p-glycidyl ether is irradiated with electron beams, X-rays or far ultraviolet rays, and alkali development is carried out. The copolymer is represented by the formula and contains 1-50mol% styrene p-glycidyl ether. When bisazido groups as a sensitizer are substituted for hydroxyl groups in poly-p-hydroxystyrene, the resulting copolymer has sensitivity only to ultraviolet rays. This copolymer having glycidyl groups has sensitivity to electron beams and X-rays besides ultraviolet rays and shows high resolving power. It is synthesized by reacting poly-p-hydroxystyrene with epichlorohydrin. |
