发明名称 CONTRACTIVE PROJECTION EXPOSING DEVICE
摘要 PURPOSE:To enable exposure small in deviation by setting a photoreceptor at the plane same as the surface of the semiconductor substrate to be later set and automatically measuring light amt. transmitted through an optical projection system. CONSTITUTION:A photoreceptor 2' is set to a position on a stand 4 under an optical projection system before exposure, and the light amt. is measured and corrected. Then, the photoreceptor 2' is moved out of the system, and the semiconductor substrate to be exposed is set to the position on the stand 4 for setting said substrate. Light emitted from a light source 1 is passed through a projection lens 3 and projected on the substrate. Since proper exposure is executed in accordance with the light source 1 and the optical system changing every moment, even a pattern of 1mum, that is, the limit resolution of the contractive exposing device can be controlled in fluctuation to the min.
申请公布号 JPS60134241(A) 申请公布日期 1985.07.17
申请号 JP19830243314 申请日期 1983.12.23
申请人 NIPPON DENKI KK 发明人 KOSHIMIZU HIROSHI
分类号 G03B27/72;G03F7/20;H01L21/027;H01L21/30 主分类号 G03B27/72
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