发明名称 HIGH FREQUENCY SEMICONDUCTOR DEVICE ON AN INSULATING SUBSTRATE
摘要 <p>A semiconductor device comprising a conductive layer; an insulting layer mounted on the conductive layer and having an opening; terminals deposited on the insulating layer; an active semiconductor element mounted on the conductive layer or the insulating layer, and; a capacitor mounted on the conductive layer. In this device, a path between the semiconductor element and the capacitor is very short and the conductive layer serves as a heat sink.</p>
申请公布号 EP0018174(B1) 申请公布日期 1985.07.17
申请号 EP19800301162 申请日期 1980.04.10
申请人 FUJITSU LIMITED 发明人 HIRANO, YUTAKA;ITOH, MASANOBU;IZUMI, AKIRA;DOOI, YOSHIKAZU
分类号 H01L23/12;H01L23/14;H01L23/66;(IPC1-7):H01L23/56;H01L25/16 主分类号 H01L23/12
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