Planar magnetron sputtering with modified field configuration.

摘要

Planar magnetron sputtering sputters a target formed of plural target members (801, 802) from their principal surface (611, 612, 613). The plural target members are arranged on an electrode (103). The sputtering is carried out in such a condition that an electric field and magnetic field are substantially parallel in their direction as the boundary regions among the plural target members.