| 摘要 |
PURPOSE:To make the title composite applicable to material of a mask for dry etching by blending photosensitive coating liquid and a solution of metallic compound having coating forming capacity to a composition. CONSTITUTION:Photosensitive coating liquid having sensitivity to a visible ray or ultraviolet ray is used. Any solution of metallic compound having coating forming capacity or those which can form a metallic oxide coating by calcining the coating can be used. Solid matter in the solution of metallic compound is about 1 weight part to about 50 weight parts per 100 weight parts of solid matter in the photosensitive coating liquid, for instance, that contributes to solidification by irradiation of light when it is photosensitive coating liquid of negative type, and that contributes forming of a photosensitive layer removing solvent when it is coating liquid of positive type. Thus, heat resistance of the photosensitive layer is improved, and can be used effectively as a mask pattern at the time of dry etching. |
