| 摘要 |
<p>Glass photomasks having a high resolution stain pattern for use in photolithographic processes are made by migrating stain-producing cations into a surface of the glass, and heating the glass containing the stainproducing rations in a pressure vessel containing an inert liquid saturated with hydrogen under pressure at relatively low temperatures to reduce and agglomerate the stain-producing cations to form a high resolution stain pattern.</p> |
