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发明名称
PHOTORESIST COMPOSITION
摘要
申请公布号
JPS60133445(A)
申请公布日期
1985.07.16
申请号
JP19840248284
申请日期
1984.11.26
申请人
MERCK PATENT GMBH
发明人
HARUTOMUUTO HARUTONAA;HANSU YOAHIMU MEREMU;RUDORUFU KURUTSUKU
分类号
C08F2/00;C08F2/50;C08G73/00;C08G73/12;G03F7/004;G03F7/012;G03F7/027;G03F7/031;G03F7/037;G03F7/038
主分类号
C08F2/00
代理机构
代理人
主权项
地址
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