发明名称 IRON-PHOSPHORUS ELECTROPLATING BATH
摘要 PURPOSE:To provide an iron-phosphorus electroplating bath which yields a crack-free film having excellent mechanical characteristics by consisting essentially the bath of bivalent ion iron and phosphorous acid and/or phosphite. CONSTITUTION:An iron-phosphorus electroplating bath contains 20-80g bivalent iron ion for which ferrous sulfate or the like is used as a supply source and 0.01-20g, more particularly 0.1-10g phosphorous acid and/or phosphite (in the form of NaH2PO3.2H2O) for each 1l of the plating bath. The iron-phosphorus plating film having usually 0.05-10% phosphorus content is obtd. by changing the content of phosphorous acid or phosphite in such plating bath. Ammonium sulfate, etc. may be further added as electrical conductivity salt to the plating bath at 0-200g/l, boric acid, etc. as a pH buffer at 0-60g/l, acidic ammonium fluoride, etc. as a complexing agent for tri-valent iron ion at 0-20g/l. The bath temp. in the stage of using the plating bath is made room temp. -80 deg.C, pH 0.5-3.5 and cathode current density 0.5-30A/dm<2>.
申请公布号 JPS60131994(A) 申请公布日期 1985.07.13
申请号 JP19830241681 申请日期 1983.12.21
申请人 UEMURA KOGYO KK;TOYOTA JIDOSHA KK 发明人 UCHIDA HIROKI;AOYANAGI YOSHIOMI;UOTANI HIROSHI;TAKAGI YOSHIO;KATOU SHINJI;OZAWA HITOSHI
分类号 C25D3/56 主分类号 C25D3/56
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