发明名称 VACUUM DEPOSITION METHOD
摘要 PURPOSE:To extend the life of a mask for vacuum deposition and to form a vacuum deposition pattern by inducing the electric charge of the same polarity as the polarity of the electric charge of evaporating particles on said mask and performing vacuum deposition so that the evaporating particles are not stuck to the mask. CONSTITUTION:A negative mask 12 for vacuum deposition is formed by deposition on the bottom surface of a substrate 11 to be vacuum-deposited which is supported with the rear side up in an evacuated bell-jar. Silver 14 housed in a boat 13 installed to face the bottom surface of the substrate 11 is heated to melt so that evaporating particles 15 of silver are generated. The above-mentioned mask 12 is connected to the positive pole of a DC power source 16 and the high voltage of + which is the same polarity as the polarity of the evaporating particles 15 of silver having + charge is impressed thereto. Then the particles 15 repel from the mask 12 and deposit on the exposed surface of the substrate 11 without depositing on the mask thus forming the reguired silver pattern. Since the mask 12 is formed by deposition on the substrate 11, the accuracy of the pattern is improved and the laboriousness of matching the mask 12 is eliminated.
申请公布号 JPS60131962(A) 申请公布日期 1985.07.13
申请号 JP19830240351 申请日期 1983.12.20
申请人 FUJITSU KK 发明人 KAWARADA MOTONOBU
分类号 C23C14/04;H01L21/203;H01L21/285 主分类号 C23C14/04
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