| 摘要 |
PURPOSE:To obtain a resist compsn. high in sensitivity of X-rays and capable of forming a fine resist image high in precision by incorporating an org. compd. having Br and/or I in a styrene type polymer contg. cross-linking active groups. CONSTITUTION:An objective X-ray resist is obtained by incorporating (A) a polymer having each of repeating units represented by the formula (X is H, 1- 4C alkyl, halogen, or the like; Y1, Y2 are each H, methyl, or halogen; and R<1>- R<5> are each H, 1-4C alkyl, or cross-linking active groups, or the like, and at least one of them is a cross-linking active group), obtainable by (co)polymerizing a styrene type monomer, such as o-chloromethylstyrene, (B) an org. compd. having Br and/or conductive substrate, such as dibromocyclohexane or N-bromomethyl phthalimide. |
