| 发明名称 |
A positive lithographic resist composition. |
| 摘要 |
<p>A positive lithographic resist compositions comprises a phenol resin and a sensitizer having the structure R - O-(D-O)n-D-OR min wherein n is an integer from 1 to 5, each of R and R min is <CHEM> and D is CH2-CH2-, <CHEM> o</p> |
| 申请公布号 |
EP0147596(A2) |
申请公布日期 |
1985.07.10 |
| 申请号 |
EP19840113726 |
申请日期 |
1984.11.14 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ECONOMY, JAMES;MCKEAN, DENNIS RICHARD;MILLER, ROBERT DENNIS;WILLSON, CARLTON GRANT |
| 分类号 |
H01L21/027;G03C1/72;C08L61/00;C08L61/04;C08L61/06;G03F7/022;(IPC1-7):G03F7/08 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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