发明名称 |
PHOTOELECTRONIC CONVERSION DEVICE AND METHOD OF PRODUCING SAME |
摘要 |
In the typical embodiment of the invention described herein, a photoelectronic conversion device comprises a transparent insulative substrate, a first transparent electrode layer of Sn-incorporated In2O3 having a relatively low sheet resistance and a thickness of about 1000 ANGSTROM , a second transparent electrode layer of SnO2 having a relatively high plasma resistance and a thickness of several tens to several hundreds of Angstroms, an amorphous semiconductor film formed by a plasma CVD process at a substrate temperature of about 200 DEG -250 DEG C., and a metal electrode. |
申请公布号 |
GB2117176(B) |
申请公布日期 |
1985.07.10 |
申请号 |
GB19830003478 |
申请日期 |
1983.02.08 |
申请人 |
* FUJI ELECTRIC COMPANY LTD;* FUJI ELECTRIC CORPORATE RESEARCH AND DEVELOPMENT CO LTD |
发明人 |
KAZUMI * MURAYAMA;YOSHIYUKI * UCHIDA |
分类号 |
H01L31/04;H01L27/142;H01L31/0392;(IPC1-7):H01L29/46;H01L31/02 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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