发明名称 PHOTOELECTRONIC CONVERSION DEVICE AND METHOD OF PRODUCING SAME
摘要 In the typical embodiment of the invention described herein, a photoelectronic conversion device comprises a transparent insulative substrate, a first transparent electrode layer of Sn-incorporated In2O3 having a relatively low sheet resistance and a thickness of about 1000 ANGSTROM , a second transparent electrode layer of SnO2 having a relatively high plasma resistance and a thickness of several tens to several hundreds of Angstroms, an amorphous semiconductor film formed by a plasma CVD process at a substrate temperature of about 200 DEG -250 DEG C., and a metal electrode.
申请公布号 GB2117176(B) 申请公布日期 1985.07.10
申请号 GB19830003478 申请日期 1983.02.08
申请人 * FUJI ELECTRIC COMPANY LTD;* FUJI ELECTRIC CORPORATE RESEARCH AND DEVELOPMENT CO LTD 发明人 KAZUMI * MURAYAMA;YOSHIYUKI * UCHIDA
分类号 H01L31/04;H01L27/142;H01L31/0392;(IPC1-7):H01L29/46;H01L31/02 主分类号 H01L31/04
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