| 摘要 |
PURPOSE:To obtain a medium having a large thetak and excellent S/N by adding an additive element of a kind or two linds of Nd, Yb and a kind of Fe, Co or two kinds of amorphous alloy. CONSTITUTION:An amorphous alloy having the axis of easy magnetization in the direction vertical to the film surface has a composition indicated by an ordinary expression of RxM1-x, where R is a kind or more of Nd, Yb, M is a kind or more of Fe, Co and X is in the range of 0.1<X<0.4. As the additive element, B, Bi, Si, Zr of 0.1mol or less are added. The sputter film using an alloy target as the alloy or a miltiple target using several kinds of targets of each element is formed on a substrate as the amorphous alloy film using a composite target method where a chip of Nd, Yb or additive element is placed on the target of Fe, Co, etc. Characteristic can be improved by 10-50% through addition of the additive element to them.
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