发明名称 COMPOSITION FOR POLISHING
摘要 PURPOSE:To obtain the composition for polishing with which the material which is in thin layer form and possesses high brittleness does not generate surface defect by reacting inorganic powder with a coupling agent and dispersing said powder into organic solvents. CONSTITUTION:A proper amount (desirably 1-2wt% for inorganic powder) of coupling agent is mixed and reacted with inorganic powder, and the surface of the powder is applied with the coating of the coupling agent. In this case, the coupling agent is selected from the group consisting of silane coupling agent and titanium coupling agent. The inorganic powder treated with the coupling agent is dispersed into organic solvent, and the polishing agent for polishing the surface of the mirror-surface material such as metal, glass, etc. is constituted. Therefore, polishing effect can be improved without forming surface defects for the material which is in thin layer form and possesses high brittleness.
申请公布号 JPS60127965(A) 申请公布日期 1985.07.08
申请号 JP19830233031 申请日期 1983.12.09
申请人 MATSUSHITA DENKI SANGYO KK 发明人 MENYA KAZUNORI;HIRAO KUNIO
分类号 B24B37/00 主分类号 B24B37/00
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