| 摘要 |
PURPOSE:To obtain a desired process response curbe without being governed by a characteristic of a sensitized material, by controlling independently a developing efficiency of each developing machine and an applied developing bias, and executing as development. CONSTITUTION:When a developing bias potential of a developing machine 1 is set to VB2, and a rotating speed is set to a suitable value, a development is executed on a photosensitive drum 3 to a density shown by a curve (b). Thereafter, the drum 3 is moved to a position of a developing machine 2 and developed again. Subsequently, when the developing bias potential of the developing machine 2 is set to VB1, and a rotating speed of the developing machine 2 is set so that a density on the drum 3 developed by the developing machine 2 becomes as shown by a curve (a), the density is added, and a process response of a curve (c) is obtained. |
