发明名称 SEMICONDUCTOR TREATING DEVICE
摘要 PURPOSE:To improve the economity at the time of driving the exhaust system and to prevent the lowering of the cleaning degree of air within a clean room by controlling the quantity of exhaust gas from a reaction chamber and the quantity of air to be supplied to a clean room in accordance with the opening degree of an opening window of the reaction chamber. CONSTITUTION:In cleaning booths 9-1, 9-2 and 9-3 as reaction chambers are provided exhaust pipes 10-1, 10-2 and 10-3, respectively. These exhaust pipes are connected to an exhaust fan 12 via a purifier 11. In respective opening windows provided in the cleaning booths are provided opening window position sensors 13-1, 13-2 and 13-3. A controller 14 computes the opening area of respective cleaning booths based on the outputs from respective sensors, and sends out a control signal by which the exhaust quantity is adjusted so that the air flow velocity at the opening part assumes a predetermined standard value. Consequently, exhaustion of gas more than the necessity is unrequired and economity at the time of operating the exhaust gas system is improved and further the cleaning degree of the clean room is prevented from lowering.
申请公布号 JPS61191818(A) 申请公布日期 1986.08.26
申请号 JP19850032299 申请日期 1985.02.20
申请人 TOSHIBA CORP 发明人 OGINO MASANOBU;MIYASHITA MORIYA
分类号 F24F7/06;H01L21/302;H01L21/3065 主分类号 F24F7/06
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