| 摘要 |
PURPOSE:To prevent striation and to attain good reproducibility of a pattern by dissolving a specified quinonediazide type photosensitive agent and an alkali- soluble resin in a solvent composed essentially of ethylcellosolve acetate dissolving a fluorinated surfactant. CONSTITUTION:A good resist can be obtained by dissolving 2,3,4-trihydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate, and an alkali-soluble cresol novolak resin obtained by condensing m-cresol and p-cresol mixture with formaldehyde, in a solvent composed essentially of ethylcellosolve acetate dissolving a fluorinated surfactant to form a positive type photoresist compsn., using it to form a good coat film free from any striation, and patternwise exposing it. |
