| 摘要 |
PURPOSE:To uniforming a thin film vapor-deposition on a substrate substantially by arranging a pair of filaments and a pair of thermion attracting electrodes oppositely in a manner these hold a cluster beam from both sides to attract thermions from the filaments in parallel. CONSTITUTION:In the means 12a and 12b for ionizing a cluster beam, a pair of filaments 9a and 9b are arranged in parallel with facing to each other in a manner these holds the cluster beam from both sides. A pair of thermion attracting electrodes 10a and 10b are similarly arranged in parallel facing to each other inside the filaments in parallel facing to each other inside the filaments in a manner that these hold the cluster beam from both sides. At this time, thermions e<-> are attracted from the filaments 9a and 9b by the electrodes 10a and 10b in parallel respectively and run in parallel as those are to be bombarded against the clusters from the both sides. Accordingly, a band zone of slightly high electron density is produced only in the center of the electrodes 10a and 10b and an electron density in the cluster beam is almost made uniform and a bombardment probability of clusters and electrons also becomes almost uniform. A distribution of cluster ions which reach the substrate is made uniform thereby uniformizing a thin film to be formed remarkably. |
