发明名称 METHOD OF VAPOR DEPOSITION OF THIN FILM
摘要 PURPOSE:To obtain the thin film of strong adhesion property in multilayer by generating a mixed layer in the multilayer to be produced by arranging two pairs of ion guns comprising crucibles containing metal to be vapor-deposited in a vacuum tank composing a cluster ion beam vapor deposition device with inclination in a manner that an interval between them becomes narrow at the upper ends and by attaching shutters on the upper planes of them which are opened simultaneously at a certain time. CONSTITUTION:Two pairs of cluster ion guns 50a and 50b supported by insulating support members 19a and 20a, 19b and 20b respectively are arranged in a vacuum tank 1 having an exhaust path 2 at the bottom with inclination in a manner that an interval between them becomes narrow at the upper ends. The guns 50a and 50b are provided with crucibles having nozzles 4a or 4b for containing ITO 5 or Cu 5b, ionizing means 12a and acclerating electrodes 14a. By these means, cluster ions 15a, 15b, 16a and 16b are produced and are bombarded against a surface of the substrate 18 arranged oppositely. At this time, shutters 30a and 30b are arranged on the upper planes of the guns 50a and 50b, which open simultaneously at formation of a mixed layer.
申请公布号 JPS60124934(A) 申请公布日期 1985.07.04
申请号 JP19830235585 申请日期 1983.12.12
申请人 MITSUBISHI DENKI KK 发明人 YAMANISHI KENICHIROU;SHIYUHARA AKIRA;MINOWA YOSHIFUMI;IWATANI YASUYUKI
分类号 C23C14/22;C23C14/24;C30B23/08;H01L21/203 主分类号 C23C14/22
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