发明名称 MANUFACTURE OF INSULATED GATE TYPE SEMICONDUCTOR DEVICE
摘要 PURPOSE:To produce inverters by high integration by a method wherein a semiconductor of single crystal or polycrystalline structure further forming a channel is provided in the periphery of two sides of a laminated body in three layers, and the two titled devices are manufactured by using this semiconductor. CONSTITUTION:A non-single crystal semiconductor 13 of a photo transmitting conductive film containing tin oxide as the main constituent is provided on an insulating substrate 1, and an insulator 14 and a semiconductor 15 as the same conductivity type as that of the semiconductor 13 are laminated into a laminated body. A source and a drain are composed by using the semiconductors 13 and 15, a channel-forming region of non-single crystal semiconductor covering a conductor 23 and the insulator 24 being provided in adjacent to the side of the laminated body, and a gate insulation film 16 and a gate electrode 20 being provided on this region. At that time, the semiconductor constituting this region is allowed to have a single crystal or polycrystalline structure by irradiation with strong light or laser beam, resulting in the manufacture of the two titled devices.
申请公布号 JPS60124974(A) 申请公布日期 1985.07.04
申请号 JP19830234102 申请日期 1983.12.12
申请人 HANDOUTAI ENERUGII KENKYUSHO:KK 发明人 YAMAZAKI SHIYUNPEI
分类号 H01L21/20;H01L21/324;H01L21/763;H01L21/8234;H01L27/088;H01L27/12;H01L29/78;H01L29/786 主分类号 H01L21/20
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